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Rapid thermal processing for future semiconductor devices : proceedings of the 2001 International Conference on Rapid Thermal Processing for Future Semiconductor Devices (RTP 2001), held at Ise-Shima, Mie, Japan, November 14-16, 2001 /

This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokk...

Пълно описание

Автор-организации: International Conference on Rapid Thermal Processing for Future Semiconductor Devices Ise-Shima, Mie, Japan)
Други автори: Fukuda, Hisashi.
Формат: Електронна книга
Език: English
Публикувано: Amsterdam ; London : Elsevier, 2003.
Предмети:
Semiconductors > Heat treatment > Congresses.
Rapid thermal processing > Congresses.
Semiconductors > Heat treatment > Congresses. Rapid thermal processing > Congresses.
TECHNOLOGY & ENGINEERING > Electronics > Solid State.
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.
Rapid thermal processing.
Semiconductors > Heat treatment.
Electronic books.
Conference papers and proceedings.
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Подобни документи: Print version:: Rapid thermal processing for future semiconductor devices.
Онлайн достъп от Библиотека ”Паница” на Американския университет в България:

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Провери в Paniza Library, AUBG Сигнатура: TK7871.85 .I57665 2001eb

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